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Effect of Boron Concentration on the UV Photosensitivity of Silica Glass Film for Planar Lightwave Circuit
Kwon Ki Youl , Cho Seung-Hyun , Shin Dong Wook , Song Kug-Hyun , Lee Nak Kyu , Na Kyoung Hwan
J. Korean Ceram. Soc. 2004;41(11):826
DOI: https://doi.org/10.4191/kcers.2004.41.11.826
Refractive Index Control by Dopant for Thick Silica films Deposited by FHD
김용탁, 서용곤, 윤형도, 임영민, 윤대호
J. Korean Ceram. Soc. 2003;40(6):589
DOI: https://doi.org/10.4191/kcers.2003.40.6.589
Optical Properties and Structural Analysis of SiO2 Thick Films Deposited by Plasma Enhanced Chemical Vapor Deposition
Sung-Min Cho, Yong-Tak Kim, Yong-Gon Seo, Hyung-Do Yoon, Young-Min Im, Dae-Ho Yoon
J. Korean Ceram. Soc. 2002;39(5):479
DOI: https://doi.org/10.4191/kcers.2002.39.5.479
         Cited By 1
The Effect of RF Power and $SiH_4$/($N_2$O+$N_2$) Ratio in Properties of SiON Thick Film for Silica Optical Waveguide
김용탁, 조성민, 서용곤, 임영민, 윤대호
J. Korean Ceram. Soc. 2001;38(12):1150
The Fabrication of Er/Al Co-doped Silica Films for 1.55 $mutextrm{m}$ Optical Amplifier
노성인, 김재선, 정용순, 신동욱, 송국현
J. Korean Ceram. Soc. 2001;38(12):1144
Spectroscopic Analysis of Silica Soot for Planar Waveguide by FHD(Flame Hydrolysis Deposition) Method
류형래, 김재선, 신동욱
J. Korean Ceram. Soc. 2001;38(1):74
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