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J. Korean Ceram. Soc. > Volume 40(6); 2003 > Article
Journal of the Korean Ceramic Society 2003;40(6): 589.
doi: https://doi.org/10.4191/kcers.2003.40.6.589
FHD법에 의해 증착된 실리카막의 도펀트 첨가에 의한 굴절률 제어
김용탁, 서용곤1, 윤형도1, 임영민1, 윤대호
성균관대학교 신소재공학과
1전자부품연구원 광부품연구센터
Refractive Index Control by Dopant for Thick Silica films Deposited by FHD
Silica based Planar Lightwave Circuits (PLC) have been applied to various kinds of wave-guided optical passive devices. SiO$_2$ (buffer) and GeO$_2$-SiO$_2$ (core) thick films have been deposited by Flame Hydrolysis Deposition (FHD). The SiO$_2$ films were produced by the flame hydrolysis reaction of halide materials such as SiCl$_4$, POCl$_3$ and BCl$_3$ into an oxy-hydrogen torch. The P concentration increased from 2.0 to 2.8 at% on increasing the POCl$_3$/BCl$_3$ flow ratio. The refractive index increased from 1.4584 to 1.4605 on increasing the POC1$_3$/BC1$_3$ flow ratio from 0.6 to 2.6. The refractive index of GeO$_2$-SiO$_2$ films was controlled by the GeCl$_4$ flow rate. The refractive index increased from 1.4615 to 1.4809 on increasing the GeCl$_4$ flow rate from 30 to 120 sccm.
Key words: Flame hydrolysis deposition, Consolidation, Silica, PLC
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