| Home | E-Submission | Sitemap | Login | Contact Us |  
top_img
J. Korean Ceram. Soc. > Volume 39(3); 2002 > Article
Journal of the Korean Ceramic Society 2002;39(3): 278.
doi: https://doi.org/10.4191/kcers.2002.39.3.278
FHD 공정으로 제조한 실리카 막의 저온 고밀화
김태홍, 윤기현1
한국전자통신연구원 정보화기술연구소
1연세대학교 세라믹 공학과
Low Temperature Consolidation of Silica Film by Flame Hydrolysis Deposition
Tae-Hong Kim, Ki-Hyun Yoon1
Information Technology Research Group, Electronics and Telecommunication Research Institute
1Department of Ceramic Engineering, Yonsei University
ABSTRACT
For planar optical devices, silica film deposited by FHD was fabricated at low temperature. To prepare silica film at low temperature, we have changed B, P amounts and investigated consolidation effect with varying consolidation temperature and atmosphere on microstructural change, and also observed optical property. The optimum consolidation temperature in He was lower than that of other atmosphere, its temperature could be lowered to 1050$^{circ}C$. As a result, the roughness of flat silica film prepared at 1050$^{circ}C$ showed 5, 6nm.
Key words: Flame hydrolysis deposition, Consolidation, Silica film
Editorial Office
Meorijae Bldg., Suite # 403, 76, Bangbae-ro, Seocho-gu, Seoul 06704, Korea
TEL: +82-2-584-0185   FAX: +82-2-586-4582   E-mail: ceramic@kcers.or.kr
About |  Browse Articles |  Current Issue |  For Authors and Reviewers
Copyright © The Korean Ceramic Society. All rights reserved.                      Developed in M2PI