| FHD(Flame Hydrolysis Deposition)공정으로 제작된 SiO2 광도파막의 분광학적 분석 |
| 김윤제, 신동욱 |
| 한양대학교 세라믹공학과 |
| Spectroscopical Analysis of SiO2 Optical Film Fabricated by FHD(Flame Hydrolysis Deposition) |
| Yun-Je Kim, Dong-Wook Shin |
| Department of Ceramic Engineering, Hanyang University |
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| ABSTRACT |
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Since many process parameters of FHD(Flame Hydrolysis Deposition) are involved in forming multi-component amorphous silica film ($SiO_2-B_2O_3-P_2O_5-GeO_2$), it has not been easy to predict the optical, mechanical and thermal properties of deposited film from the simple process parameters, such as source flow rate. Furthermore, the prediction of final composition of film becomes even more difficult after sintering at high temperature due to the evaporation of volatile dopants. The motivation of the study was to clarify the quantitative relationship between simple process parameters such as the flow rate of source gases and resulting chemical composition of sintered film. Hence, the compositional analysis of silica soot by FTIR(Fourier Transformation Infrared Spectroscopy) and ICP-AES(Inductively Coupled Plasma-Atomic Emission Spectrometry) under the control of the amount of dopant was carried out to obtain the quantitative composition. By measuring spectrum of absorbance from FTIR, the compositional change of B-O, Si-O, OH($H_2O$) in silica film was measured. The concentrations of these dopants were also measured by ICP-AES, which were compared with the FTIR result. The final quantitative relationship between simple process parameters and composition was deduced from the comparison between two results. |
| Key words:
FHD, Silica film, FTIR, ICP-AES, Quantitative relationship |
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