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Electronics Ceramics and Energy Ceramics
Structural and Optical Properties of HfO2 Films on Sapphire Annealed in O2 Ambient
Jong-Chan Park, Yung-Sup Yoon, Seong-Jun Kang
J. Korean Ceram. Soc. 2016;53(5):563-567.   Published online September 30, 2016
DOI: https://doi.org/10.4191/kcers.2016.53.5.563
                           Cited By 8
A Study of the Memory Characteristics of Al2O3/Y2O3/SiO2 Multi-Stacked Films with Different Tunnel Oxide Thicknesses
Hye Young Jung, Yoo Youl Choi, Hyung Keun Kim, Doo Jin Choi
J. Korean Ceram. Soc. 2012;49(6):631
DOI: https://doi.org/10.4191/kcers.2012.49.6.631
      
Electrical Characteristics of Al2O3/TaAlO4/SiO2 Multi-layer Films by Different Tunnel Oxide Thicknesses and Annealing Treatment
Jung-Tae Park, Hyo-June Kim, Doo-Jin Choi
J. Korean Ceram. Soc. 2010;47(5):461
DOI: https://doi.org/10.4191/kcers.2010.47.5.461
      
A Study on the Electrical Properties of Al2O3/La2O3/Al2O3 Multi-Stacked Films Using Tunnel Oxide Annealed at Various Temperatures
Hyo-June Kim, Seung-Yong Cha, Doo-Jin Choi
J. Korean Ceram. Soc. 2009;46(4):436
DOI: https://doi.org/10.4191/kcers.2009.46.4.436
      
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