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J. Korean Ceram. Soc. > Volume 29(11); 1992 > Article
Journal of the Korean Ceramic Society 1992;29(11): 863.
스핀-온-글라스 박막의 제조와 분석
임경란, 최두진1, 박선진
한국과학기술연구원 세라믹스 공정연구실
1연세대학교 세라믹공정과
Preparation and Analysis of the SOG Films
A SOG(spin glass) solution with excellent wetting to Si wafers was prepared by acid-hydrolysis of Si(OEt)4 and Me2Si(OEt)2. The solution was spin coated on Si wafers, and effects of heat treatment of the film were characterized by TG/DTA, FTIR and Ellipsometry. Silica film was obtained by heat treatment at $600^{circ}C$ within one hour, but heat treatment at 80$0^{circ}C$ caused interfacial oxidation of the silicon substrate. Unexpectedly silica films with much better adhesion were obtained by curing at $600^{circ}C$ for over 30 min. than those obtained by thermal oxidation.
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