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J. Korean Ceram. Soc. > Volume 27(6); 1990 > Article
Journal of the Korean Ceramic Society 1990;27(6): 790.
MOCVD법으로 제조된 알루미나 박막의 특성
최두진, 임공진1, 정형진, 송한상1, 김창은1
한국과학기술연구원 무기재료연구실
1연세대학교 요업공학과
Characteristics of Alumina Film Prepared by MOCVD
ABSTRACT
Al2O3 film was chemically deposited by pyrolytic decom,positio of the Al-tri-isopropoxide/N2 system at 350$^{circ}C$, 30 and 1.86torr. FTIR analysis showed a deposited film was a hydrated alumina and transformed to an anhydrous one after heat treatment(1hr, >800$^{circ}C$ or 4hr, >500$^{circ}C$) in N2 atmosphere. This transformation influenced on the CV-hysteresis of Si-Al2O3 structure. Also, a pH sensitivity of EIS(Electrolyte-Insulator-Semiconductor)structure using Si-Al2O3/SiO2 film was 50mV/pH in the range of pH 3 to 7.
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