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J. Korean Ceram. Soc. > Volume 26(3); 1989 > Article
Journal of the Korean Ceramic Society 1989;26(3): 381.
BPSG막의 Flow 특성
홍성현, 이종무1, 송성해2
1인하대학교 금속공학과
2경웅대학교 전자공학과
Flow Characteristics of the BPSG Film
Effects of annealing temperature, time, and atmospehre on the flow characteristics of Atmospheric Pressure Chemical Vapor Deposition-borophosphosilicate glass were investigated. Stable step coverage can be obtained by annealing the BPSG film at 90$0^{circ}C$ for 30 minutes in N2 atmosphere, but further heat treatment isnot effective. Flow characteristics of the BPSG film was better in steam atmosphere than in N2 atmosphere, and the factors which cause it were analyzed. The concentration of boron in the BPSG film was measured pretty accurately by FTIR spectrum. Boron content in the BPSG film was reduced by annealing treatment. The decrement of boron was greater in steam atmosphere than in the N2 atmosphere. Also it was found from the FTIR spectroscopic analysis that PH3 inhibited the oxidation of B2H6.
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