|
|
|
Journal of the Korean Ceramic Society 1989;26(2): 235. |
| CVD법으로 합성된 알루미나 박막 및 분말의 열처리에 따른 특성 |
| 최두진, 정형진 |
| 한국과학기술원 무기재료연구실 |
| Properties of the Chemically Vapor Deposited Alumina Thin Film and Powder on Heat Treatment |
|
|
|
|
|
|
|
| ABSTRACT |
|
A study on the APCVD(atmospheric pressure chemical vapor deposition) Al2O3 was done by using the aluminum-tri-isopropoxide/N2 reaction system at 40$0^{circ}C$. When the flow rate of the carrier gas(N2) was over 2SLPM, heterogeneous reaction was observed. However, when the flow rate of the carrier gas was below 2SLPM, a porously deposited film or powder formation was observed. The film formed by a heterogeneous reaction was optically dense. The dense film is thought to be a kind of a hydrated alumina. After a thermal treatment of the film in the range of temperature from $600^{circ}C$ to 1, 20$0^{circ}C$, properties of the film seems to be changed due to dehydration and densification process. In the case of the powder on heat treatment(600~1, 20$0^{circ}C$), both a phase transformation and the change of OH peak was observed. |
|
|
|
PDF Links
Full text via DOI 
Download Citation 
