| Thermal plasma arc discharge method for high‑yield production of hexagonal AlN nanoparticles: synthesis and characterization |
| Lakshmanan Kumaresan1, Gurusamy Shanmugavelayutham1, Subramani Surendran2,3,4, Uk Uk Sim2,3,4,5 |
1Department of Physics, Bharathiar University, Tamil Nadu, Coimbatore 641046, India
2Department of Material Science and Engineering, Engineering Research Center, Chonnam National University, Gwangju 61186, Republic of Korea
3Optoelectronics Convergence Research Center, Chonnam National University, Gwangju 61186, Republic of Korea
4Future Energy Engineering Convergence, College of AI Convergence, Chonnam National University, Gwangju 61186, Republic of Korea
5Research Institute, NEEL Sciences INC., Gwangju 61186, Republic of Korea |
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Received: September 27, 2021; Revised: November 26, 2021 Accepted: December 10, 2021. Published online: May 31, 2022. |
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| ABSTRACT |
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Large scale with high-purity hexagonal aluminum nitride nanoparticles (AlN NPs) was synthesized using DC thermal plasma arc discharge method (TPAD). Argon gas was used as the plasma forming gas, while ammonia (NH3) gas was used as the reactive gas, which was fed into the reactor at a constant flow rate of 5 LPM. In order to optimize the process for high yield, the experiments were carried out at various plasma input powers, such as 1.5, 3.0, and 4.5 kW. Following the optimization, to examine the influence of using pure nitrogen gas, an experiment was also carried out in the nitrogen ambience. The phase identification and structural determination of the synthesized NPs were carried out using XRD and Raman spectroscopic analyses. While the morphology, particle size, and elemental compositions of the synthesized NPs were observed from SEM, HRTEM, XPS, and EDX analyses. The photoluminescence response was confirmed from the PL spectrum. The PL emission peaks observed around 440 nm (2.8 eV) and 601 nm (2.07 eV), respectively, which correspond to the UV blue and red band emissions of both AlN and Al/AlN NPs. The results show that the synthesized nano-AlN NPs exhibit excellent crystallinity with a high yield of approximately 210 g/h. The current plasma technology can be regarded as a perfect potential process for developing nano-AlN powders with improved efficiency. |
| Key words:
Plasma arc discharge · AlN nanoparticles · Plasma input power · NH3 gas · Characterization |
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