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J. Korean Ceram. Soc. > Volume 47(6); 2010 > Article
Journal of the Korean Ceramic Society 2010;47(6): 479.
doi: https://doi.org/10.4191/kcers.2010.47.6.479
기판 바이어스 인가에 따른 나노결정질 TiN 코팅 막의 미세구조와 기계적 성질변화
목포대학교 신소재공학과
Microstructure and Mechanical Properties of Nanocrystalline TiN Films Through Increasing Substrate Bias
Sung-Yong Chun
Department of Advanced Materials Science and Engineering, Mokpo National University
Microstructural and mechanical properties of the TiN films deposited on Si substrates under various substrate bias voltages by a reactive magnetron sputtering have been studied. It was found that the crystallographic texture, microstructural morphology and mechanical property of the TiN films were strongly depended on the substrate bias voltage. TiN films deposited without bias exhibited a mixed (200)-(111) texture with a strong (200) texture, which subsequently changed to a strong (111) texture with increasing bias voltage. It is also observed that the crystallite size decreases with increasing bias voltage, which corresponds to the increasing diffraction peak width of XRD patterns. The average surface roughness was calculated from AFM images of the films; these results indicated that the average surface roughness was increased with an increase in the bias voltage of the coatings.
Key words: TiN coating, Substrate bias, Texture, Stress, Nanoindentation
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