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J. Korean Ceram. Soc. > Volume 44(10); 2007 > Article
Journal of the Korean Ceramic Society 2007;44(10): 585.
doi: https://doi.org/10.4191/kcers.2007.44.1.585
RF 마그네트론 스퍼터링을 이용한 태양전지용 질화 실리콘 반사방지막
최균, 최의석, 황진하1, 이수홍2
요업기술원 이천분원
1홍익대학교 신소재공학과
2세종대학교 전략에너지연구소
Anti-reflection Coating of Silicon Nitride Film for Solar Cell by RF Magnetron Sputtering
Kyoon Choi, Eui-Seok Choi, Jin-Ha Hwang1, Soo-Hong Lee2
KICET Icheon Branch Institute
1Hong-Ik University
2Sejong University
Silicon nitride films for an anti-reflection coating were deposited on silicon via RF magnetron sputtering using a $Si_3N4$ target. The best result was obtained at the sputtering condition of 340 W RF power, 5 mtorr Ar atmosphere, $100^{circ}C$ substrate temperature. The films showed 7.9% reflectance minimum with 2.35 refractive index. 0.21 absorption coefficient at 66.6 nm thickness. The surface morphology showed a smooth and dense film with good adhesion to silicon surface.
Key words: AR coating(anti-reflection coating), Silicon nitride, Solar cell, RF magnetron sputtering
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