| 광도파로 제작을 위한 단결정 LiNbO3 건식 식각 특성 |
| 박우정, 양우석1, 이한영1, 윤대호 |
성균관대학교 신소재공학과
1전자부품연구원 광부품센터 |
| Dry Etching Characteristics of LiNbO3 Single Crystal for Optical Waveguide Fabrication |
| Woo-Jung Park, Woo-Seok Yang1, Han-Young Lee1, Dae-Ho Yoon |
Department of Advanced Materials Engineering, Sungkyunkwan University
1Optical Telecommunication Components Laboratory, Korea Electronics Technology Institute |
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| ABSTRACT |
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The etching characteristics of a $LiNbO_{3}$ optical waveguide structure have been investigated using neutral loop discharge plasma with the mixture of $C_{3}F_{8}$ and Ar and the bias power parameters. The etching rate and profile angle of optical waveguide with etching parameters were evaluated by scanning electron microscopy. Also, the etching RMS roughness was evaluated by atomic force microscopy. From the results of optimum etching conditions are the $C_{3}F_{8}$ gas flow ratio of 0.2 and the bias power of 300 W. |
| Key words:
Neutral loop plasma, Surface roughness, Etch rate, Sidewall angle |
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