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J. Korean Ceram. Soc. > Volume 41(12); 2004 > Article
Journal of the Korean Ceramic Society 2004;41(12): 900.
doi: https://doi.org/10.4191/kcers.2004.41.12.900
나노기공성 기판을 사용한 산화물박막의 제조
박용일, Fritz B. Prinz1
금오공과대학교 신소재시스템공학부
Fabrication of Oxide Thin Films Using Nanoporous Substrates
Yong-Il Park, Fritz B. Prinz1
School of Materials and System Engineering, Kumoh National Institute of Technology
1Department of Mechanical Engineering, Stanford University
ABSTRACT
Solid oxide fuel cells have a limitation in their low-temperature application due to the low ionic conductivity of electrolyte materials and difficulties in thin film formation on porous gas diffusion layer. These problems can be solved by improvement of ionic conductivity through controlled nanostructure of electrolyte and adopting nanoporous electrodes as substrates which have homogeneous submicron pore size and highly flattened surface. In this study, ultra-thin oxide films having submicron thickness without gas leakage are deposited on nanoporous substrates. By oxidation of metal thin films deposited onto nanoporous anodic alumina substrates with pore size of $20nm{sim}200nm$ using dc-magnetron sputtering at room temperature, ultra-thin and dense ionic conducting oxide films with submicron thickness are realized. The specific material properties of the thin films including gas permeation, grain/gran boundaries formation, change of crystalline structure/microstructure by phase transition are investigated for optimization of ultra thin film deposition process.
Key words: Solid oxide fuel cell, Thin film, Nanoporous substrate
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