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J. Korean Ceram. Soc. > Volume 41(4); 2004 > Article
Journal of the Korean Ceramic Society 2004;41(4): 328.
doi: https://doi.org/10.4191/kcers.2004.41.4.328
RE Magnetron Sputtering에 의해 제조된 HAp와 HAp-Ag복합코팅층의 미세조직
Microstructures of HAp and HAp-Ag Composite Coating Layer Prepared by RS Magnetron Sputtering
Hee-Jung Lee, Ik-Hyun Oh1, Sang-Shik Park2, Byong-Taek Lee
School of Advanced Materials Engineering, Kongju National University
1School of Advanced Materials Engineering, Kongju National Universit
2Department of Advanced Materials Engineering, Sangju National Universit
Hydroxyapatite (HAp) and HAp-Ag composite layers were coated on ZrO$_2$and Si wafer substrates by RF magnetron sputtering technique. The thickness of coating layers was in the range of 0.7∼1.0$mutextrm{m}$ and its roughness was 3∼4nm. The heat treated HAp coating layers were composed with nano-sized crystallines. However, the HAp-Ag composite layers showed the mixed structure with crystalline and amorphous phases. The Ca/P ratio of the as-received HAp coating layer was 1.9, but, the value was decreased as the Ag content with increased. Also, the Vickers hardness of HAp coating layer decreased as the Ag content increase.
Key words: RF magnrtron sputtering, Hydroxyapatite coating, Ag coating, Si microstuctute
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