| Home | E-Submission | Sitemap | Login | Contact Us |  
J. Korean Ceram. Soc. > Volume 41(1); 2004 > Article
Journal of the Korean Ceramic Society 2004;41(1): 36.
doi: https://doi.org/10.4191/kcers.2004.41.1.036
RF-magnetron Sputtering법에 의해 제조된 SnO2 박막 특성에 대한 열처리 분위기 효과
최광표, 박용주, 류현욱, 노효섭1, 권용1, 박진성1
조선대학교 에너지자원신기술연구소
1조선대학교 신소재공학과
Effects of Annealing Atmosphere on the Characteristics of Tin Oxide Films Prepared by RF-magnetron Sputtering
Gwang-Pyo Choi, Yong-Ju Park, Hyun-Wook Ryu, Whyo-Sup Noh1, Yong Kwon1, Jin-Seong Park1
Research Institute of Energy Resources Technology, Chosun University
1Department of Advanced Materials Engineering, Chosun University
$SnO_2$ thin films were deposited on a $SiO_2$/Si substrate with the flow of Ar and $O_2$ of 25 sccm by RF-magnetron sputtering method. the post-annealing was conducted at $500^{circ}C$ in atmosphere of dry air and $N_2$ were changed fairly, while those annealed in dry air resembled as-deposited films. This may be attributed to the desorption of adsorbed oxygen and the extraction of lattice oxygen during annealing. Resistivity of films annealed in $N_2$ was increased over 5 times than that of as-deposited films. It can be explained that the increment of resistivity may result from the discontinuous conduction path with change of microstructures after annealing in $N_2$.
Key words: Thin films, Tin dioxide, Annealing, XPS
Editorial Office
Meorijae Bldg., Suite # 403, 76, Bangbae-ro, Seocho-gu, Seoul 06704, Korea
TEL: +82-2-584-0185   FAX: +82-2-586-4582   E-mail: ceramic@kcers.or.kr
About |  Browse Articles |  Current Issue |  For Authors and Reviewers
Copyright © The Korean Ceramic Society.                      Developed in M2PI