| 하이브리드 플라즈마 입자가속 충격퇴적(Hybrid Plasma - Particle Accelerating Impact Deposition, HP-PAID) 프로세스에 의한 Si 나노구조 코팅층의 제조 및 특성평가 |
| 이형직, 권혁병, 정해경, 장성식, 윤상옥, 이형복1, 이홍림2 |
강릉대학교 세라믹공학과
1명지대학교 세라믹공학과
2연세대학교 세라믹공학과 |
| Synthesis of Nanostructured Si Coatings by Hybrid Plasma-Particle Accelerating Impact Deposition (HP-PAID) and their Characterization |
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| ABSTRACT |
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Using a recently developed Hybric Plasma-Particle Accelerating Impact Deposition (HP-PAID) process, synthesis of nanostructured silicon coatings has been investigated by injecting vapor-phase TEOS (tetraethosysilane, (C$_2$H$_$5/O)$_4$Si) into an Ar hybrid plasma. The plasma jet with reactants was expanded through nozzle into a deposition chamber, with the pressure dropping from 700 to 10 torr. Ultrafine particles accelerated in the free jet downstream of the nozzle, deposited by an inertial impaction onto a temperature controlled substrate. By using this process, nanostructured amorphous silicon coatings with grain size smaller than 10 nm could be synthesized. These samples were annealed in an Ar and crystallized at 900$^{circ}C$ for 30 min. TEM analysis showed that the annealed coatings were also composed of nanoparticles smaller than 10 nm, which showed a good consistency that the average grain size of 7 nm was also estimated from a peak shift of 2.39 cm$^$-1/ and Full Width at Half Maximum (FWHM) 5.92 cm$^$-1/ of Raman analysis. The noteworthy is that a strong PL peak at 398 nm was also obtained for this sample, which indicates that the deposited coatings also contained 3∼4 nm nanostructured grains. |
| Key words:
Plasma, Nanostructured Si, TEOS, Coating, PL |
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