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J. Korean Ceram. Soc. > Volume 38(8); 2001 > Article
Journal of the Korean Ceramic Society 2001;38(8): 687.
The Effect of La-silicon Oxynitride on the Densification of ${Si_3}{N_4}$ Ceramics by Spark Plasma Sintering
Kyeong-Sik Cho, Sungjin Kim, Sung-Ho Beak, Heon-Jin Park1, June-Gunn Lee1
Department of Materials Science and Engineering, Kumoh National University of Technology
1Multifunctional Ceramics Research Center
Silicon nitride-La-silicon oxynitride ceramics were fabricated by Spark Plasma Sintering (SPS). The density, crystalline phase and microstructure were compared with those obtained by Hot Pressing (HP). The full density was achieved within 40 min by spark plasma sintering at 1$650^{circ}C$, whereas the same result was required by hot pressing with a dwell time of 500 min at higher temperature. There were some differences in the microstructure and second phases in the sintered ceramics, which are attributed to the rapid densification in the spark plasma sintering. The fine and acicular grain microstructure appeared in spark plasma sintering.
Key words: Spark plasma sintering, Hot pressing, Silicon nitride, Oxynitride, Densification, Microstructure
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