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J. Korean Ceram. Soc. > Volume 35(7); 1998 > Article
Journal of the Korean Ceramic Society 1998;35(7): 715.
도포 열분해법을 이용하여 MgO(100) 기판위에 제조한 $Pb(Zr, Ti)O_3$ 박막의 에피탁시와 표면 미세구조에 미치는 열처리 온도의 영향
이형민, 황규석, 김병훈, 진부고명1, Iwao Yamaguchi1, Toshiya Kumagai1, Susumu Mizuta1
전남대학교 공과대학 세라믹공학과
1일본 물질공학 공업기술 연구소 무기재료부
Effect of Annealing Temperature on Epitaxy and Surface morphology of $Pb(Zr, Ti)O_3$ Thin Films on MgO (100) Substrate by Dipping-Pyrolysis Process
$Pb(Zr,Ti)O_3$ (Zr : Ti=0.52:0.48) thin films were fabricated bydipping-pyrolysis process on MgO(100) sub-strates with metal naphthenates used as staring materials. Effects of final heat-treatment temperatuer on epitaxy and surface morphology of the films were investigated. Highly oriented (00l)/(h00) films prefired at $200^{circ}C$ were obtained at final heat-treatment temperatures of $750~800^{circ}C$ and from the results of the X-ray diffraction pole-figure analysis these films had epitaxial relationship with substrates used. Film heat-trated at $750^{circ}C$ had a smooth surface and showed no distinct texture while the rosette-type microstructure caused by lead volatilization was observed in the film after heat -treatment at $800^{circ}C$
Key words: $Pb(Zr, Ti)O_3$ thin films, Dipping-pyrolysis process, MgO(100), Metal naphthenates, Epitaxial relationship
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