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Journal of the Korean Ceramic Society 1997;34(5): 467. |
다공성실리콘의 탄화를 이용한 PL의 열적안정성 증진 |
최두진, 서영제, 전희준, 박홍이1, 이덕희1 |
연세대학교 세라믹공학과 1연세대학교 물리학과 |
Enhancement of Thermal Stability in Photoluminescence by Carbonization of Porous silicon |
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ABSTRACT |
Porous silicon was prepared by an anodic etching. The pore size was about 10 nm at an etching time of 20 sec and a current density of 20 mA/$textrm{cm}^2$. The porous layer was composed of an micro-porous layer (0.6 ${mu}{textrm}{m}$) and a macro-porous layer (10 ${mu}{textrm}{m}$). Room temperature PL with maximum peak 6700$AA$ appeared. The peak disappeared by an oxidation reaction when the porous silicon was heated to 100~20$0^{circ}C$ in atmosphere. In order to avoid the oxidation a heat treatment was done in H2 atmosphere. The micro-pore and Si column, which formed quantum well, were collapsed by the high temperature. The PL maximum peak of heated sample was gradually red-shifted and showed about 300$AA$ red-shift at 50$0^{circ}C$. The intensity of PL was maintained to high temperatures in lower pressures. The porous Si was carbonized in C2H2+H2 gas in order to increase thermal stability. The carbonization of the porous Si prevented red-shift of the maximum PL peak caused by sintering effect at high temperatures, and the carbonized porous Si showed Pl signal at higher temperatures by above 20$0^{circ}C$ than the sample in H2 atmosphere. |
Key words:
Porous silicon, Photoluminescence(PL), Carbonization, Thermal stability |
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