The Numerical Simulation of Ultrafine <TEX>$SiO_2$</TEX> Particle Fabrication and Deposition by Using the Tube Furnace Reactor

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J. Korean Ceram. Soc. > Volume 32(11); 1995 > Article

Journal of the Korean Ceramic Society 1995;32(11): 1246.

튜브형 가열로 반응기를 이용한 초미립 $SiO_2$ 입자의 제조 및 증착에 대한 수치모사

김교선, 현봉수

강원대학교 공과대학 화학공학과

The Numerical Simulation of Ultrafine $SiO_2$ Particle Fabrication and Deposition by Using the Tube Furnace Reactor

ABSTRACT

A numerical model for fabrication and deposition of ultrafine SiO2 particles were proposed in the simplified horizontal MCVD apparatus using tube furnace reactor. The model equations such as energy and mass balance equations and the 0th, 1st and 2nd moment balance equations of aerosols were considered in the reactor. The phenomena of SiCl4 chemical reaction, SiO2 particle formation and coagulation, diffusion and thermophoresis of SiO2 particles were included in the aerosol dynamic equation. The profiles of gas temperature, SiCl4 concentration and SiO2 particle volume were calculated for standard conditions. The concentrations, sizes and deposition efficiencies of SiO2 particles were calculated, changing the process conditions such as tube furnace setting temperature, total gas flow rate and inlet SiCl4 concentration.

Key words: Simplified MCVD, Reaction and deposition efficiencies, $SiO_2$ particles, Aerosol dynamics, Thermophoresis