PublisherDOIYearVolumeIssuePageTitleAuthor(s)Link
Journal of the Korean Ceramic Society10.4191/kcers.2019.56.3.112019563302-307Effective Oxygen-Defect Passivation in ZnO Thin Films Prepared by Atomic Layer Deposition Using Hydrogen PeroxideYue Wang, Kyung-Mun Kang, Minjae Kim, Hyung-Ho Parkhttp://jkcs.or.kr/upload/pdf/kcers-2019-56-3-11.pdf, http://jkcs.or.kr/journal/view.php?doi=10.4191/kcers.2019.56.3.11, http://www.jkcs.or.kr/upload/pdf/kcers-2019-56-3-11.pdf
Thin Solid Films10.1016/j.tsf.2018.02.0302018660913-919Study on properties of Ga/F-co-doped ZnO thin films prepared using atomic layer depositionKyung-Mun Kang, Yue Wang, Minjae Kim, Hyung-Ho Parkhttps://api.elsevier.com/content/article/PII:S0040609018301172?httpAccept=text/xml, https://api.elsevier.com/content/article/PII:S0040609018301172?httpAccept=text/plain
Thin Solid Films10.1016/j.tsf.2006.09.00720075157-83335-3338Effects of substrate temperature on the microstructure and photoluminescence properties of ZnO thin films prepared by atomic layer depositionJongmin Lim, Chongmu Leehttps://api.elsevier.com/content/article/PII:S0040609006010492?httpAccept=text/xml, https://api.elsevier.com/content/article/PII:S0040609006010492?httpAccept=text/plain
Defect and Diffusion Forum10.4028/www.scientific.net/ddf.329.1592012329159-164Growth of ZnO Thin Films on Silicon Substrates by Atomic Layer DepositionRosniza Hussin, Xiang Hui Hou, Kwang Leong Choyhttps://www.scientific.net/DDF.329.159.pdf
Thin Solid Films10.1016/j.tsf.2007.11.0442008516186158-6166Conformal ZnO coatings on high surface area silica gel using atomic layer depositionJ.A. Libera, J.W. Elam, M.J. Pellinhttps://api.elsevier.com/content/article/PII:S0040609007019141?httpAccept=text/xml, https://api.elsevier.com/content/article/PII:S0040609007019141?httpAccept=text/plain
Catalysts10.3390/catal10010092202010192Active IrO2 and NiO Thin Films Prepared by Atomic Layer Deposition for Oxygen Evolution ReactionDJ Donn Matienzo, Daniel Settipani, Emanuele Instuli, Tanja Kalliohttps://www.mdpi.com/2073-4344/10/1/92/pdf
Thin Solid Films10.1016/j.tsf.2003.10.00420044462227-231Growth of aluminum nitride thin films prepared by plasma-enhanced atomic layer depositionYong Ju Lee, Sang-Won Kanghttps://api.elsevier.com/content/article/PII:S0040609003013580?httpAccept=text/xml, https://api.elsevier.com/content/article/PII:S0040609003013580?httpAccept=text/plain
Thin Solid Films10.1016/j.tsf.2010.08.15120105192747-750Deposition of Al doped ZnO layers with various electrical types by atomic layer depositionCheol Hyoun Ahn, Hyoungsub Kim, Hyung Koun Chohttps://api.elsevier.com/content/article/PII:S0040609010012812?httpAccept=text/xml, https://api.elsevier.com/content/article/PII:S0040609010012812?httpAccept=text/plain
Thin Solid Films10.1016/j.tsf.2020.1383852020714138385Modulating the band alignment and current conduction mechanism of ZrO2/In0.2 Ga0.8As gate stack by atomic-layer-deposited ZnO passivation layerChen Liu, Hongliang Lu, Yuming Zhang, Yimen Zhang, Zhuofan Wanghttps://api.elsevier.com/content/article/PII:S0040609020305940?httpAccept=text/xml, https://api.elsevier.com/content/article/PII:S0040609020305940?httpAccept=text/plain
Thin Solid Films10.1016/j.tsf.2007.07.1502008516124036-4039Protection of polymer from atomic-oxygen erosion using Al2O3 atomic layer deposition coatingsRussell Cooper, Hari P. Upadhyaya, Timothy K. Minton, Michael R. Berman, Xiaohua Du, Steven M. Georgehttps://api.elsevier.com/content/article/PII:S0040609007013004?httpAccept=text/xml, https://api.elsevier.com/content/article/PII:S0040609007013004?httpAccept=text/plain