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Quantum Mechanical Simulation for the Analysis, Optimization and Accelerated Development of Precursors and Processes for Atomic Layer Deposition (ALD)
Thomas Jeffrey Lomax Mustard, Hyunwook Shaun Kwak, Alexander Goldberg, Jacob Gavartin, Tsuguo Morisato, Daisuke Yoshidome, Mathew David Halls
J. Korean Ceram. Soc.. 2016;53(3):317-324.   Published online 2016 May 31    DOI: https://doi.org/10.4191/kcers.2016.53.3.317

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Quantum Mechanical Simulation for the Analysis, Optimization and Accelerated Development of Precursors and Processes for Atomic Layer Deposition (ALD)
Journal of the Korean Ceramic Society. 2016;53(3):317-324   Crossref logo
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Atomic layer deposition (ALD): from precursors to thin film structures
Thin Solid Films. 2002;409(1):138-146   Crossref logo
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Dynamic Modeling for the Design and Cyclic Operation of an Atomic Layer Deposition (ALD) Reactor
Processes. 2013;1(2):128-152   Crossref logo
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Atomic Layer Deposition (ALD)
Vacuum Deposition Onto Webs, Films and Foils. 2015;361-369   Crossref logo
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Metallic Copper Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition of Air Stable Precursors
Advanced Engineering Materials. 2016;19(2):1600593   Crossref logo
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Semiconductors, Electrochemical Atomic Layer Deposition (E-ALD)
Encyclopedia of Applied Electrochemistry. 2014;1947-1953   Crossref logo
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Bis(tert-butylimido)-bis(dialkylamido) Complexes of Molybdenum as Atomic Layer Deposition (ALD) Precursors for Molybdenum Nitride: the Effect of the Alkyl Group
Chemical Vapor Deposition. 2008;14(3-4):71-77   Crossref logo
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(Invited) The Surface Chemistry of Atomic Layer Deposition (ALD) Processes for Metal Nitride and Metal Oxide Film Growth
ECS Transactions. 2019;33(2):291-305   Crossref logo
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Metal oxides and metal thin films by atomic layer deposition (ALD), liquid-ALD, and successive ionic layer adsorption and reaction methods for THR applications
Energy Saving Coating Materials. 2020;153-182   Crossref logo
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Optimization of PbSe Nanofilms formation by Electrochemical Atomic Layer Deposition (ALD)
ECS Transactions. 2019;19(3):245-272   Crossref logo
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