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The Properties and Uniformity Change of Amorphous SiC:H Film Deposited using Remote PECVD System with Various Deposition Conditions

Sung-Hyuk Cho, Yoo-Youl Choi, Doo-Jin Choi

J. Korean Ceram. Soc.. 2010;47(3):262 DOI: https://doi.org/10.4191/kcers.2010.47.3.262

Hydrogenated amorphous silicon film as intrinsic passivation layer deposited at various temperatures using RF remote-PECVD technique

Minsung Jeon, Shuhei Yoshiba, Koichi Kamisako

Current Applied Physics. 2010;10(2):S237-S240

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Chemical and Mechanical Properties of Hydrogenated Amorphous Silicon Nitride Films Deposited in Various PECVD Systems

Jerzy Kanicki, Nancy Voke

MRS Proceedings. 1986;68:

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Optical and Electrical Properties of Hydrogenated Amorphous Silicon Nitride Films Deposited in Various PECVD systems

Nancy Voke, Jerzy Kanicki

MRS Proceedings. 1986;68:

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Properties of amorphous silicon carbide film deposited by PECVD on glass

J.L. He, M.H. Hon, L.C. Chang

Materials Chemistry and Physics. 1996;45(1):43-49

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Annealing effects on a-SiC:H and a-SiC:H(F) thin films deposited by PECVD at room temperature

Y Lee

Thin Solid Films. 1995;261(1-2):192-201

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Properties of Amorphous Hydrogenated Silicon Carbide (a-SiC:H) Films Formed by Remote Hydrogen Microwave Plasma CVD From a Triethylsilane Precursor: Part 2

Agnieszka Walkiewicz-Pietrzykowska, Aleksander M. Wrobel, Bartosz Glebocki

Chemical Vapor Deposition. 2009;15(1-3):47-52

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Physical Properties of Undoped and Doped Microcrystalline SiC:H Deposited by PECVD

F. Demichelis, C. F. Pirri, E. Tresso, G. Dellamea, V. Rigato, P. Rava

MRS Proceedings. 1991;219:

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The Properties of a-SiC:H and a-SiGe:H Films Deposited by 55 kHz PECVD

B.G. Budaguan, A.A. Sherchenkov, A.E. Berdnikov, J.W. Metselaar, A.A. Aivazov

MRS Proceedings. 1999;557:

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Dependence of a-Sl:H/Si3N4 interface properties on the deposition sequence in amorphous silicon thin film transistor produced by remote PECVD process

S.S. Kim, G.N. Parsons, G.G. Fountain, G. Lucovsky

Journal of Non-Crystalline Solids. 1989;115(1-3):69-71

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Segmented Modeling of Large-Area VHF PECVD Thin-Film Amorphous Silicon Deposition System

Krishna Shenai, Krushal Shah, Ramasamy Raju, Aarohi Vijh

ECS Meeting Abstracts. 2011;MA2011-02(29):1978-1978

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