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Study on the Compositions of Photosensitive Ag Paste for Patterning Embedded Fine-Line Inductor in LTCC
Sang-Myoung Lee, Seong-Dae Park, Myong-Jae Yoo, Woo-Sung Lee, Nam-Kee Kang, Sahn Nahm
J. Korean Ceram. Soc.. 2007;44(3):157    DOI: https://doi.org/10.4191/kcers.2007.44.3.157

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Preparation of Photosensitive Gel Films and Fine Patterning of Amorphous Al2O3–SiO2 Thin Films
Materials Research Bulletin. 1998;33(1):21-30   Crossref logo
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Fine line patterning at a low cost
Materials Today. 2007;10(9):63   Crossref logo
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Lift-off techniques for fine line metal patterning
Microelectronics Journal. 1983;14(6):122   Crossref logo
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Lift-off techniques for fine line metal patterning
Microelectronics Reliability. 1982;22(6):1192   Crossref logo
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Solder paste for fine line printing in hybrid microelectronics
Microelectronics Reliability. 1997;37(3):544   Crossref logo
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Photosensitive PZT gel films and their preparation for fine patterning
Materials Science and Engineering: B. 2003;99(1-3):168-172   Crossref logo
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New thick-film copper paste for ultra-fine line circuits
Microelectronics Reliability. 1990;30(5):1016   Crossref logo
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Large area fine line patterning by scanning projection lithography
Microelectronics Reliability. 1996;36(4):547-548   Crossref logo
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Photosensitive poly(vinylene carbonate)s based on reaction development patterning with dilute aqueous alkaline solution
Polymer International. 2015;64(11):1560-1567   Crossref logo
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Photosensitive thick film paste
Microelectronics Reliability. 1975;14(3):283   Crossref logo
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