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Effect of Annealing Temperature on Epitaxy and Surface morphology of $Pb(Zr, Ti)O_3$ Thin Films on MgO (100) Substrate by Dipping-Pyrolysis Process
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J. Korean Ceram. Soc.. 1998;35(7):715

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Epitaxial Pb(Zr,Ti)O3 thin films on LaAlO3 (100) by dipping–pyrolysis process
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Highly oriented Pb(Zr,Ti)O3 thin films on textured LaNiO3 electrode by dipping–pyrolysis process
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The influence of prefiring conditions on the epitaxy of Pb(Zr,Ti)O3 films by dipping-pyrolysis process
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Effect of substrate material on the crystallinity and epitaxy of Pb(Zr,Ti)O3 thin films
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Towards low-temperature deposition of piezoelectric Pb(Zr,Ti)O3: Influence of pressure and temperature on the properties of pulsed laser deposited Pb(Zr,Ti)O3
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Nucleation and growth behavior of epitaxial Pb(Zr,Ti)O 3 /MgO(100) observed by atomic force microscopy
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Effect of Substrate on Crystallization of Sol-Gel-Derived Pb(Zr0.52Ti0.48)O3 Thin Films by Microwave Annealing
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Effect of substrates on epitaxy of Bi4Ti3O12 thin films by dipping—pyrolysis process
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Low-temperature laser processes for synthesizing (100)-textured Pb(Zr,Ti)O3 thin films on Si substrate
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