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Study on Properties of Antimony-doped Tin Oxide Thin Films Prepared by Sputtering
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J. Korean Ceram. Soc.. 1996;33(7):735

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Preparation and properties of antimony-doped tin oxide films deposited by R.F. reactive sputtering
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The properties of tin-doped indium oxide films prepared by pulsed magnetron sputtering from powder targets
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Electrical and Optical Properties of Fluorine Doped Tin Oxide Thin Films Prepared by Magnetron Sputtering
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Electrochromic properties of N-doped tungsten oxide thin films prepared by reactive DC-pulsed sputtering
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Properties of indium tin oxide films with indium tin modulation layers prepared by nano-scale controlled reactive magnetron sputtering
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Microstructure and physical properties of nanofaceted antimony doped tin oxide thin films deposited by chemical vapor deposition on different substrates
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Properties of indium tin oxide (ITO) films prepared by r.f. reactive magnetron sputtering at different pressures
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Properties of indium tin oxide films prepared by rf reactive magnetron sputtering at different substrate temperature
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