PublisherDOIYearVolumeIssuePageTitleAuthor(s)Link
Surface Modification of Textiles10.1533/9781845696689.1262009126-138Textile surface functionalisation by chemical vapour deposition (CVD)J.I.B. Wilsonhttps://api.elsevier.com/content/article/PII:B9781845694197500064?httpAccept=text/xml, https://api.elsevier.com/content/article/PII:B9781845694197500064?httpAccept=text/plain, http://woodhead.metapress.com/index/P00V571581Q9X456.pdf
Applied Surface Science10.1016/s0169-4332(00)00047-72000159-160556-560Epitaxial growth of 3C-SiC films on Si substrates by triode plasma CVD using dimethylsilaneKanji Yasui, Kunio Asada, Tadashi Akahanehttps://api.elsevier.com/content/article/PII:S0169433200000477?httpAccept=text/xml, https://api.elsevier.com/content/article/PII:S0169433200000477?httpAccept=text/plain
Surface Science10.1016/0039-6028(92)90879-b19922711-2237-243AES study of the SiO2/SiC interface in the oxidation of CVD β-SiCR. Berjoan, J. Rodriguez, F. Sibieudehttps://api.elsevier.com/content/article/PII:003960289290879B?httpAccept=text/xml, https://api.elsevier.com/content/article/PII:003960289290879B?httpAccept=text/plain
Precision Engineering10.1016/0141-6359(93)90202-l1993154305Surface characteristics of ion milled CVD SIChttps://api.elsevier.com/content/article/PII:014163599390202L?httpAccept=text/xml, https://api.elsevier.com/content/article/PII:014163599390202L?httpAccept=text/plain
Applied Surface Science10.1016/s0169-4332(01)00477-920011841-455-59Surface preparation of 4H–SiC substrates for hot-wall CVD of SiC layersG. Wagner, J. Doerschel, A. Gerlitzkehttps://api.elsevier.com/content/article/PII:S0169433201004779?httpAccept=text/xml, https://api.elsevier.com/content/article/PII:S0169433201004779?httpAccept=text/plain
Applied Surface Science10.1016/s0169-4332(03)00443-420032161-4580-584Radio frequency power dependence of the characteristics of 3C-SiC on Si grown by triode plasma CVD using dimethylsilaneKanji Yasui, Masahiro Hashiba, Tadashi Akahanehttps://api.elsevier.com/content/article/PII:S0169433203004434?httpAccept=text/xml, https://api.elsevier.com/content/article/PII:S0169433203004434?httpAccept=text/plain
Thin Solid Films10.1016/s0040-6090(01)01268-820013951-2260-265Surface modification of silicon related materials using a catalytic CVD system for ULSI applicationsAkira Izumihttps://api.elsevier.com/content/article/PII:S0040609001012688?httpAccept=text/xml, https://api.elsevier.com/content/article/PII:S0040609001012688?httpAccept=text/plain
Surface and Coatings Technology10.1016/j.surfcoat.2005.03.009200620014-154489-4492Oxidation behavior of 2D C/SiC with a multi-layer CVD SiC coatingShoujun Wu, Laifei Cheng, Litong Zhang, Yongdong Xuhttps://api.elsevier.com/content/article/PII:S0257897205004445?httpAccept=text/xml, https://api.elsevier.com/content/article/PII:S0257897205004445?httpAccept=text/plain
Surface and Coatings Technology10.1016/j.surfcoat.2013.01.007201321975-81Effect of CVD SiC seal coating on the mechanical properties of Cf/SiC composites generated through CVIUdayakumar A., Stalin M., Venkateswarlu K.https://api.elsevier.com/content/article/PII:S0257897213000753?httpAccept=text/xml, https://api.elsevier.com/content/article/PII:S0257897213000753?httpAccept=text/plain
Precision Engineering10.1016/s0141-6359(00)00056-8200125156-62Evaluation of surface characteristics of ground CVD-SiC using cast iron bond diamond wheelsChunhe Zhanga, Hitoshi Ohmori, Teruko Kato, Noboru Moritahttps://api.elsevier.com/content/article/PII:S0141635900000568?httpAccept=text/xml, https://api.elsevier.com/content/article/PII:S0141635900000568?httpAccept=text/plain