Plasma Resistance and Etch Mechanism of High Purity SiC under Fluorocarbon Plasma
Mi-Ran Jang, Yeong-Kyeun Paek, Sung-Min Lee
J. Korean Ceram. Soc. 2012;49(4):328 DOI: https://doi.org/10.4191/kcers.2012.49.4.328
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