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SiON/SiO₂ Multilayer Deposited by PECVD for Low-Loss Waveguides

김용탁, 김동신, 윤대호

J. Korean Ceram. Soc. 2004;41(3):197
DOI: https://doi.org/10.4191/kcers.2004.41.3.197

Optical Properties and Structural Analysis of SiO₂ Thick Films Deposited by Plasma Enhanced Chemical Vapor Deposition

Sung-Min Cho, Yong-Tak Kim, Yong-Gon Seo, Hyung-Do Yoon, Young-Min Im, Dae-Ho Yoon

J. Korean Ceram. Soc. 2002;39(5):479
DOI: https://doi.org/10.4191/kcers.2002.39.5.479

Cited By 1

Effects of $N_2O$/$SiH_4$Flow Ratio and RF Power on Properties of $SiO_2$Thick Films Deposited by Plasma Enhanced Chemical Vapor Deposition

조성민, 김용탁, 서용곤, 임영민, 윤대호

J. Korean Ceram. Soc. 2001;38(11):1037

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