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Improvement of electrostatic damage resistance of photomasks with conductive ITO film fabricated using UAPS (UV-Assisted-Partial-Strip) method
Jangsik In, Byoungkyu Jin, Dae-Yong Jeong
J. Korean Ceram. Soc.
2021;58(5):623-629. Published online September 30, 2021
DOI:
https://doi.org/10.1007/s43207-021-00138-0
1
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Materials Science, Ceramics - Q1
Journal Impact Factor 2.5