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Microstructure and Magnetic Properties of Pulsed DC Magnetron Sputtered Zn
0.8
Co
0.2
O Film Deposited at Various Substrate Temperatures
Young-Hun Kang, Bong-Seok Kim, Weon-Pil Tai, Ki-Chul Kim, Su-Jeung Suh, Tae-Seok Park, Young-Sung Kim
J. Korean Ceram. Soc.
2006;43(2):79
DOI:
https://doi.org/10.4191/kcers.2006.43.2.079
Microstructure and Magnetic Properties of Zn
1-x
Co
x
O Film Prepared by Pulsed
DC Magnetron Sputtering
Yoon-Duk Ko, Seok-Bae Ko, Moon-Soon Choi, Weon-Pil Tai, Ki-Chul Kim, Jong-Min Kim, Su-Jeung Soh, Young-Sung Kim
J. Korean Ceram. Soc.
2005;42(3):211
DOI:
https://doi.org/10.4191/kcers.2005.42.3.211
Deposition Characteristic of InN
x
Films by Reactive
DC Magnetron Sputtering
송풍근, 류봉기, 김광호
J. Korean Ceram. Soc.
2003;40(8):739
DOI:
https://doi.org/10.4191/kcers.2003.40.8.739
Electrical Properties of Sputtered Gallium-doped Zinc Oxide Films Deposited Using Ne, Ar, or Kr Gas
Pung-Keun Song, Bong-Ki Ryu, Kwang-Ho Kim
J. Korean Ceram. Soc.
2002;39(10):935
DOI:
https://doi.org/10.4191/kcers.2002.39.10.935
Cited By 1
Study on Properties of Antimony-doped Tin Oxide Thin Films Prepared by Sputtering
김층완, 김광호, 이환수, 이혜용
J. Korean Ceram. Soc.
1996;33(7):735
Preparation of ATO Thin Films by
DC Magnetron Sputtering
(II)Electrical Properties
윤천, 이혜용, 정윤중, 이경희
J. Korean Ceram. Soc.
1996;33(5):514
Preparation of ATO Thin Films by
DC Magnetron Sputtering
(I) Deposition Characteristics
윤천, 이혜용, 정윤중
J. Korean Ceram. Soc.
1996;33(4):441
1
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Materials Science, Ceramics - Q1
Journal Impact Factor 2.7
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