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Search for adsorption geometry of precursor on surface using genetic algorithm: MoO2Cl2 on SiO2 surface
Jason Kim, Jun-Young Jo, In-Gyu Choi, Yeong-Cheol Kim
J. Korean Ceram. Soc. 2020;57(6):694-700.   Published online November 30, 2020
DOI: https://doi.org/10.1007/s43207-020-00079-0
      
Dispersion Characteristics of α-Fe2O3 Nanopowders Coated with Titanium Dioxide by Atomic Layer Deposition
Hae Ryul Ok, Bo Kyung Lee, Hye Jin Bae, Hyug Jong Kim, Byung Ho Choi
J. Korean Ceram. Soc. 2017;54(2):137-140.   Published online March 31, 2017
DOI: https://doi.org/10.4191/kcers.2017.54.2.04
                                 Cited By 1
Quantum Mechanical Simulation for the Analysis, Optimization and Accelerated Development of Precursors and Processes for Atomic Layer Deposition (ALD)
Thomas Jeffrey Lomax Mustard, Hyunwook Shaun Kwak, Alexander Goldberg, Jacob Gavartin, Tsuguo Morisato, Daisuke Yoshidome, Mathew David Halls
J. Korean Ceram. Soc. 2016;53(3):317-324.   Published online May 31, 2016
DOI: https://doi.org/10.4191/kcers.2016.53.3.317
                                 Cited By 4
Electrical and Optical Properties of Zinc Oxide Thin Films Deposited Using Atomic Layer Deposition
Jeong-Eun Kim, Seung-Muk Bae, Hee-Sun Yang, Jin-Ha Hwang
J. Korean Ceram. Soc. 2010;47(4):353
DOI: https://doi.org/10.4191/kcers.2010.47.4.353
         Cited By 8
Enhanced Stability of LiCoO2 Cathodes in Lithium-ion Batteries Using Surface Modification by Atomic Layer Deposition
Yoon-S. Jung, Andrew S. Cavanagh, Anne C. Dillon, Markus D. Groner, Steven M. George, Se-Hee Lee
J. Korean Ceram. Soc. 2010;47(1):61
DOI: https://doi.org/10.4191/kcers.2010.47.1.061
         Cited By 7
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