Mechanical Damage Behavior of Single Crystalline Silicon by Scratching Test

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doi:2003.40.1.104

J. Korean Ceram. Soc. > Volume 40(1); 2003 > Article

Journal of the Korean Ceramic Society 2003;40(1): 104.
doi: https://doi.org/10.4191/kcers.2003.40.1.104

Scratching Test에 의한 단결정 실리콘의 기계적 손상거동

김현호, 정성민, 이홍림

연세대학교 세라믹공학과

Mechanical Damage Behavior of Single Crystalline Silicon by Scratching Test

ABSTRACT

COF(Coefficient Of Friction), AE(Acoustic Emission), micro-cracks and crystal structure of the single crystalline silicon were investigated according to the induced normal load during scratching test. Scratching tests were performed with the loading rate of 100 N/min and various scratching speeds of 1, 3, 6, 10 mm/min from 0 up to 30 N of the maximum normal load. In consequence, COF, AE and crack density were observed to increase with increasing normal load or increasing scratching speed. Phase transformations from the silicon diamond structure to other structures were observed in the scratched grooves for the slow scratching speeds using micro-Raman spectroscopy.

Key words: Silicon, Scratching test, Micro-Raman spectroscopy, AE(Acoustic Emission), Phase transformation