Effect of Total Reaction Pressure on the Microstructure of the SiC Deposited Layers by Low Pressure Chemical Vapor Deposition

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J. Korean Ceram. Soc. > Volume 38(4); 2001 > Article

Journal of the Korean Ceramic Society 2001;38(4): 388.

저압 화학증착법에 의한 SiC 증착층의 미세구조에 미치는 전체 반응압력의 영향

박지연, 이민용, 김원주, 김정일, 홍계원, 윤순길¹

한국원자력연구소 기능성재료
¹충남대학교 재료공학과

Effect of Total Reaction Pressure on the Microstructure of the SiC Deposited Layers by Low Pressure Chemical Vapor Deposition

Key words: SiC, CVD, Total reaction pressure

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