| 화학증착 탄화규소막의 방향성과 미세구조가 증착층의 기계적 성질에 미치는 영향 |
| 김동주, 김영욱1, 박상환1, 최두진, 이준근1 |
연세대학교 세라믹공학과
1한국과학기술연구원 세라믹스연구부 |
| Effects of Preferred Orientation and Microstructure on Mechanical Properties of Chemically Vapor Deposited SiC |
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| ABSTRACT |
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Silicon carbide (SiC) films have been deposited on the isotropic graphite by chemical vapor deposition. Change of deposition parameters affected significantly the microstructure and preferred orientation of SiC films. Preferred orientation of SiC films was (111) or (220), and microstructure showed the startified structure consisting of small crystallite or faceted columnar structure depending on the deposition parameters. For microhardness, (111) oriented film and stratified structure were superior to (220) oriented film and faceted columnar structure, respectively. Surface of (111) oriented films was less rough than that of (220) oriented films. Adhesion force between graphite substrate and SiC films was above 100N for crystalline films and 49N for amorphous film. |
| Key words:
SiC film, Chemical vapor deposition, Microhardness, Preferred orientation |
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